- J. Davis, D. Brown, W. Henderson, “ Fractal Electrode Formation in Metal-Insulator Composites Near the Percolation Threshold,” IEEE Transactions on Nanotechnology, vol. 12, no. 5, pp. 725-733, Sept. 2013.
- Owen J. Hildreth, Devin Brown, Ching P. Wong, “3D Out-of-Plane Rotational Etching with Pinned Catalysts in Metal-Assisted Chemical Etching of Silicon”, Advanced Functional Materials, 2011, 21, 3119–3128.
- Nicole R. Devlin, Devin K. Brown, “Fabricating millimeter to nanometer sized cavities concurrently for nanofluidic devices”, Journal of Vacuum Science Technology B 28(6), Nov/Dec 2010
- J. Blair, D. Brown, V.A. Tamma, W. Park, C. Summers, “Challenges in the fabrication of an optical frequency ground plane cloak consisting of silicon nanorod arrays”, Journal of Vacuum Science Technology B 28(6), Nov/Dec 2010
- N.R. Devlin, D.K. Brown, P. Kohl, “Patterning decomposable polynorbornene with electron beam lithography to create nanochannels”, Journal of Vacuum Science Technology B 27(6), Nov/Dec 2009, 2508
- D.K. Brown, “Direct patterning of plasma enhanced chemical vapor deposition silicon dioxide by electron beam lithography” Journal of Vacuum Science Technology B 26(6), Nov/Dec 2008, 2451.
- D.K. Brown, “Deep ultraviolet photolithography capability of ZEP520A electron beam resist for mix and match lithography” Journal of Vacuum Science Technology B 25(6), Nov/Dec 2007, 2447.
- R.Murali, D.K. Brown, K.P. Martin, J.D. Meindl, “Improving electron beam resist sensitivity by preexposure to deep ultraviolet radiation,” Journal of Vacuum Science and Technology B, vol. 25, no. 6, pp. 2064-2067, Dec. 2007.
- R.Murali, D.K. Brown, K.P. Martin, J.D. Meindl, “Process optimization and proximity effect correction for gray scale e-beam lithography,” Journal of Vacuum Science & Technology B 24, 2936, 2006.
- Zhiping Zhou, Devin K. Brown, Eric V. Woods, Akil K. Sutton, Biren C. Patel, Leslie O. George, “Optimization of contact interface resistance for CMOS circuits”, Proceedings of the 15th Biennial University/Government/Industry Microelectronics Symposium, 174-178 (2003).